Titanium target
Product Details------------------------------------------------ -------------------------
Product Name: Target
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Grade: Ta1 Ta2
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Purity: ≥99.95%
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Density: 16.67g/cm3
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Uses: Tantalum sputtering target is a tantalum sheet obtained by pressure processing, with high chemical purity, small grain size, and recrystallization
Good organization and consistency of the three axes, mainly used for sputtering deposition of optical fiber, semiconductor wafer and integrated circuit
Coating, tantalum target material can be used for cathode sputtering coating, high vacuum getter active material, etc. It is an important material for thin film technology
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